您的位置: 专家智库 > >

国家高技术研究发展计划(2009AA03Z428)

作品数:7 被引量:24H指数:4
相关作者:张俊英李春芝杨靖安王留刚王文文更多>>
相关机构:北京航空航天大学更多>>
发文基金:国家高技术研究发展计划国家自然科学基金航天科技创新基金更多>>
相关领域:一般工业技术理学电子电信更多>>

文献类型

  • 7篇中文期刊文章

领域

  • 3篇一般工业技术
  • 3篇理学
  • 1篇电子电信

主题

  • 3篇W
  • 2篇溅射
  • 2篇光催化
  • 2篇DENSIT...
  • 2篇IN2O3
  • 2篇磁控
  • 2篇磁控溅射
  • 2篇催化
  • 1篇带隙
  • 1篇第一原理计算
  • 1篇电子能
  • 1篇电子能带
  • 1篇电子能带结构
  • 1篇电子特性
  • 1篇性能研究
  • 1篇氧分压
  • 1篇氧化物薄膜
  • 1篇氧化亚铜
  • 1篇氧化铋
  • 1篇直流磁控

机构

  • 3篇北京航空航天...

作者

  • 3篇张俊英
  • 2篇杨靖安
  • 2篇李春芝
  • 1篇李渊
  • 1篇王文文
  • 1篇王留刚

传媒

  • 3篇功能材料
  • 2篇Chines...
  • 2篇Rare M...

年份

  • 5篇2012
  • 2篇2011
7 条 记 录,以下是 1-7
排序方式:
氧化铋薄膜的制备及光催化性能研究被引量:5
2011年
采用磁控溅射制备了氧化铋薄膜,研究了制备工艺对薄膜的结构、微观形貌和光学性能的影响,并对样品进行了光催化性能评价。结果表明,氧氩比和退火温度显著影响薄膜的性能。当氧氩比为20:80时获得的薄膜具有最佳光催化性能;随退火温度升高,薄膜结晶性增强,并逐渐出现Bi和Si的氧化物,经500℃退火的薄膜具有最强的光催化活性。
王留刚张俊英李春芝杨靖安
关键词:氧化铋磁控溅射光催化
Oxygen vacancy in N-doped Cu_2 O crystals:A density functional theory study
2012年
The N-doping effects on the electronic properties of Cu2O crystals are investigated using density functional theory.The calculated results show that N-doped Cu2O with or without oxygen vacancy exhibits different modifications of electronic band structure.In N anion-doped Cu2O,some N 2p states overlap and mix with the O2p valence band,leading to a slight narrowing of band gap compared with the undoped Cu2O.However,it is found that the coexistence of both N impurity and oxygen vacancy contributes to band gap widening which may account for the experimentally observed optical band gap widening by N doping.
李敏张俊英张跃王天民
关键词:电子能带结构光学带隙电子特性
铜及其氧化物薄膜对大肠杆菌的强抑制作用被引量:5
2012年
采用直流磁控溅射,靶材为金属铜靶,调节氧气和氩气流量,制备了以石英玻璃为基底颗粒大小在20~50nm之间的Cu和Cu2O纳米薄膜,研究了大肠杆菌与纳米铜系氧化物薄膜的相互作用。通过紫外可见分光光度计,掠入射小角X射线衍射(GIXRD),SEM分别对样品的光学性能、晶体结构、形貌特征进行了研究,发现纳米Cu和Cu2O薄膜均对大肠杆菌具有强抑制作用。在光照下,Cu2O薄膜除了具有金属离子抗菌效应外,光催化抗菌效应表现强烈;Cu薄膜表面有部分被氧化为Cu2O,有助于协同抗菌。
杨靖安张俊英李春芝
关键词:大肠杆菌光催化抗菌
Preparation and properties of tungsten-doped indium oxide thin films被引量:9
2012年
Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical and electrical properties of IWO thin films were investigated. The thickness and surface morphology of the films are both closely dependent on the sputtering power and the substrate temperature. The transparency of the films decreases with the increase of the sputtering power but is not seriously influenced by substrate temperature. All the IWO thin film samples have high transmittance in near-infrared spectral range. With either the sputtering power or the growth temperature increases, the resistivity of the film decreases at the beginning and increases after the optimum parameters. The as-deposited IWO films with minimum resistivity of 6.4 10 4 cm were obtained at a growth temperature of225 C and sputteringpower of 40 W, with carrier mobility of 33.0 cm 2 V 1 s 1 and carrier concentration of 2.8 10 20 cm 3 and the average transmittance of about 81% in near-infrared region and about 87% in visible region.
Li, Yuan Wang, Wenwen Zhang, Junying Wang, Rongming
Effects of dopant content on optical and electrical properties of In_2O_3: W transparent conductive films被引量:3
2012年
The In 2 O 3 : W (IWO) films with different W content were deposited on glass substrate using direct current sputtering method. The structure, surface morphology, and optical and electrical properties were investigated. Results showed that both the carrier concentration and carrier mobility were increased with the doping of W. The IWO film with the lowest resistivity of 1.0×10 3 cm, highest carrier mobilityof 43.7 cm 2 V 1 s 1 and carrier concentration of 1.4×10 20 cm 3 was obtained at the content of 2.8 wt.%. The average optical transmittance from 300 nm to 900 nm reached 87.6%.
Zhang, Yuanpeng Li, Yuan Li, Chunzhi Wang, Wenwen
In_2O_3:W薄膜的制备及光电性能研究被引量:5
2011年
采用直流磁控溅射法制备了掺钨氧化铟(In2O3:W,IWO)薄膜,研究了制备工艺对薄膜表面形貌和光电性能的影响。结果表明薄膜的表面形貌与其光电性能有着紧密联系。氧分压显著影响薄膜的表面形貌进而对薄膜的光电性能产生影响,同时溅射时间的变化也显著影响薄膜的光电性能:随着氧分压以及溅射时间的升高,薄膜的电阻率均呈现先减小后增大的变化规律,在氧分压为2.4×10-1Pa条件下,制备样品的表面晶粒排布最细密,其电阻率达到6.3×10-4Ω.cm,载流子浓度为2.9×1020cm-3,载流子迁移率为34cm2/(V.s),可见光平均透射率约为85%,近红外光平均透射率>80%。
李渊王文文张俊英
关键词:直流磁控溅射氧分压表面形貌光电性能
A density functional theory study on the adsorption of CO and O_2 on Cu-terminated Cu_2O(111) surface
2012年
The adsorptions of CO and O2 molecules individually on the stoichiometric Cu-terminated Cu2O(111) surface are investigated by first-principles calculations on the basis of the density functional theory.The calculated results indicate that the CO molecule preferably coordinates to the Cu2 site through its C atom with an adsorption energy of -1.69 eV,whereas the O2 molecule is most stably adsorbed in a tilt type with one O atom coordinating to the Cu2 site and the other O atom coordinating to the Cu1 site,and has an adsorption energy of -1.97 eV.From the analysis of density of states,it is observed that Cu 3d transfers electrons to 2π orbital of the CO molecule and the highest occupied 5σ orbital of the CO molecule transfers electrons to the substrate.The sharp band of Cu 4s is delocalized when compared to that before the CO molecule adsorption,and overlaps substantially with bands of the adsorbed CO molecule.There is a broadening of the 2π orbital of the O2 molecule because of its overlapping with the Cu 3d orbital,indicating that strong 3d-2π interactions are involved in the chemisorption of the O2 molecule on the surface.
李敏张俊英张跃王天民
关键词:CO分子氧化亚铜O2第一原理计算
共1页<1>
聚类工具0