您的位置: 专家智库 > >

国家自然科学基金(10874160)

作品数:15 被引量:47H指数:4
相关作者:丁泽军张增明王忆王中平章宏更多>>
相关机构:中国科学技术大学五邑大学中国科技大学更多>>
发文基金:国家自然科学基金广东省科技计划工业攻关项目江门市科技计划项目更多>>
相关领域:理学电子电信一般工业技术电气工程更多>>

文献类型

  • 14篇期刊文章
  • 1篇会议论文

领域

  • 9篇理学
  • 3篇电子电信
  • 2篇电气工程
  • 2篇一般工业技术
  • 1篇天文地球
  • 1篇化学工程
  • 1篇金属学及工艺

主题

  • 3篇发光
  • 2篇荧光
  • 2篇铁氧体
  • 2篇锶铁氧体
  • 2篇纳米
  • 2篇磁性能
  • 2篇LUMINE...
  • 1篇单分子
  • 1篇单分子层
  • 1篇等离子体蚀刻
  • 1篇第一性原理
  • 1篇电场
  • 1篇电场强度
  • 1篇电子衍射
  • 1篇荧光分光光度...
  • 1篇荧光粉
  • 1篇有效厚度
  • 1篇诱致
  • 1篇预烧
  • 1篇预烧温度

机构

  • 5篇中国科学技术...
  • 4篇五邑大学
  • 1篇中国科技大学

作者

  • 5篇丁泽军
  • 4篇张增明
  • 3篇王忆
  • 2篇蔡进军
  • 2篇曾庆光
  • 2篇王中平
  • 2篇章宏
  • 1篇赵智
  • 1篇张向国
  • 1篇唐旭东
  • 1篇曾荣光
  • 1篇盛业青
  • 1篇胡社军
  • 1篇乐天
  • 1篇王哲献
  • 1篇代如成
  • 1篇刘剑
  • 1篇穆鑫
  • 1篇潘欢欢
  • 1篇沈宇华

传媒

  • 2篇高压物理学报
  • 2篇发光学报
  • 2篇电子显微学报
  • 1篇硅酸盐通报
  • 1篇人工晶体学报
  • 1篇磁性材料及器...
  • 1篇Journa...
  • 1篇Chines...
  • 1篇Plasma...
  • 1篇Rare M...
  • 1篇Intern...
  • 1篇第七届全国稀...

年份

  • 1篇2014
  • 1篇2013
  • 3篇2012
  • 3篇2011
  • 5篇2010
  • 2篇2009
15 条 记 录,以下是 1-10
排序方式:
高压诱致的反式联苯乙烯酮结构相变与化学反应
2009年
利用金刚石对顶砧(DAC)高压装置在室温下对反式联苯乙烯酮(Trans,Trans-Dibenzylideneacetone)分子晶体进行了高压拉曼谱、荧光光谱和能量色散X射线衍射(EDXRD)研究。结果表明,在压力为1.0~1.3 GPa时,反式联苯乙烯酮发生了晶体—晶体的结构相变,同时开始伴随有压力诱导的化学反应,反应完成的压力为6.5 GPa。高压X射线研究表明,这次相变有新的共价键产生,可能的化学变化过程是,C C双键打开再与相邻的分子结合生成新的共价键。在压力大约为11 GPa时,反式联苯乙烯酮分子晶体再次发生了晶体的结构相变。新产生的物质在卸压后依然保持稳定。
唐旭东张增明赵智王中平丁泽军
关键词:拉曼相变
预烧温度对锶铁氧体的微结构和磁性能的影响被引量:9
2012年
采用传统陶瓷工艺法,在相同配方、相同实验条件情况下制备了不同温度预烧的锶铁氧体,分析了预烧温度(1180℃,1200℃,1210℃,1250℃,1270℃,1290℃,1300℃,1310℃)对锶铁氧体微结构和磁性能的影响。X射线衍射分析表明,随着预烧温度的上升,锶铁氧体主体仍为六角锶铁氧体结构。预烧温度较低时,反应不完全,有Fe2O3杂相存在。通过扫描电镜对样品的形貌结构进行分析,测试结果显示铁氧体晶粒呈六角锶铁氧体片状结构,随着预烧温度的上升出现熔融甚至出现全部熔融;磁性能测试显示,样品的Br随预烧温度的上升先增大后减小,当预烧温度达到1290℃时,Br和(BH)max达到最大值,Br为422.85 mT,(BH)max为34.99 kJ/m3。Hcj先下降,预烧温度到1250℃时上升;Hcb先上升至1290℃时达到最大值,之后下降。综合各方面的性能,最佳的预烧温度确定为1290℃。
章宏王忆姚少喜吴捷
关键词:预烧温度锶铁氧体磁性能
Preparation and Characteristics of Ca2SiO4:RE(RE=Sm3+,Dy3+) Phosphors
A series phosphors of CaSiO:RE(RE=Sm,Dy) were prepared by the solid-state reaction method.The influence of ann...
王忆蔡进军潘欢欢
文献传递
玻姆量子轨迹方法研究电子衍射
2010年
电子衍射作为电子波动性的一个主要特征广泛用于物质结构特征的研究。本文采用玻姆量子轨迹方法直观而精确地描述电子衍射的动力学过程。电子散射的晶体势场通过解析赝势构建,采用劈裂算符方法求解薛定谔方程得到了电子波函数随时间的演化,计算的量子轨迹直观地显示了电子通过晶体衍射动力学过程。
曾荣光王哲献丁泽军
关键词:电子衍射
Photoluminescence study of SiO_2 coated Eu^(3+):Y_2O_3 core-shells under high pressure
2010年
Uniform core-shell Eu3+:Y2O3/SiO2 spheres were synthesized via precipitation and the Stber method.The structural transition of core-shell Eu3+:Y2O3/SiO2 was studied by using high pressure photoluminescence spectra.With pressure increasing,the emission intensities of 5D0→7F0,1,2 transitions of Eu3+ ions decreased and the transition lines showed a red shift.The relative luminescence intensity ratio of 5D0→7F2 to 5D0→7F1 transitions decreased with increasing pressure,indicating lowering asymmetry around Eu3+ ions.During compression,structural transformation for cores in the present core-shell Eu3+:Y2O3/SiO2 sample from cubic to monoclinic took place at 7.5 GPa,and then the monoclinic structure turned into hexagonal above 15.2 GPa.After the pressure was released,the hexagonal structure transformed back to monoclinic and the monoclinic structure was kept stable to ambient pressure.
代如成王中平张增明丁泽军
关键词:CORE-SHELLPHOTOLUMINESCENCERARE
硅表面直接生长十八烷基硅烷小分子自组装单层抗蚀剂的亚稳态氦原子光刻技术被引量:1
2010年
选取不同尺寸和形状的物理掩模,以硅表面直接生长的十八烷基硅烷小分子自组装单分子层作为抗蚀剂,硅(100)为衬底,亚稳态氦原子作为曝光源,利用湿法化学刻蚀方法在衬底上制备具有纳米尺寸分辨率的硅结构图形。基于扫描电子显微镜、原子力显微镜的表征结果表明:原子光刻技术可以把具有纳米尺度分辨率的正负图形通过化学湿法刻蚀技术很好地传递到硅片衬底上,特征边缘分辨率达到20nm左右,具有较高的可信度和可重复性。正负图形相互转化的临界曝光原子剂量约为5×1014atomscm-2,曝光时间约为20min。
王中平张增明仓桥光纪铃木拓丁泽军山内泰
关键词:原子光刻自组装单分子层
Luminescence properties of red-emitting Ca_2Al_2SiO_7:Eu^(3+) nanoparticles prepared by sol-gel method被引量:4
2011年
A series of red-emitting Ca2-xAl2SiO7:xEu3+(x = 1 mol.%-10 mol.%) phosphors were synthesized by the sol-gel method.The effects of annealing temperature and doping concentration on the crystal structure and luminescence properties of Ca2Al2SiO7:Eu3+ phosphors were investigated.X-ray diffraction(XRD) profiles showed that all peaks could be attributed to the tetragonal Ca2Al2SiO7 phase when the sample was annealed at 1000℃.Scanning electron microscopy(SEM) micrographs indicate that the phosphors have an irregularly rounded morphology with particles of about 200 nm.Excitation spectra showed that the strong broad band at around 258 nm and weak sharp lines in 350-490 nm were attributed to the charge transfer band of Eu3+-O2-and f-f transitions within the 4f6 configuration of Eu3+ ions,respectively.Emission spectra implied that the red luminescence could be attributed to the transitions from the 5D0 excited level to the 7FJ(J = 0,1,2,3,4) levels of Eu3+ ions with the main electric dipole transition 5D0→7F2(618 and 620 nm),and Eu3+ ions prefer to occupy a lower symmetry site in the crystal lattice.Moreover,the photoluminescence(PL) intensity was strongly dependent on both the sintering temperature and doping concentration,and the highest PL intensity was observed at an Eu3+ concentration x = 7 mol.% after annealing at 1100℃.The obtained Ca2Al2SiO7:Eu3+ phosphor may have potential application for the red lamp phosphor.
CAI JinjunPAN HuanhuanWANG Yi
关键词:红色发光发光特性凝胶法
Thickness dependence of the optical constants of oxidized copper thin films based on ellipsometry and transmittance被引量:2
2014年
Thin oxidized copper films in various thickness values are deposited onto quartz glass substrates by electron beam evaporation. The ellipsometry parameters and transmittance in a wavelength range of 300 nm–1000 nm are collected by a spectroscopic ellipsometer and a spectrophotometer respectively. The effective thickness and optical constants, i.e.,refractive index n and extinction coefficient k, are accurately determined by using newly developed ellipsometry combined with transmittance iteration method. It is found that the effective thickness determined by this method is close to the physical thickness and has obvious difference from the mass thickness for very thin film due to variable density of film.Furthermore, the thickness dependence of optical constants of thin oxidized Cu films is analyzed.
宫俊波董伟乐代如成王中平张增明丁泽军
关键词:有效厚度光学常数铜薄膜
等量La-Zn替代对锶铁氧体结构和磁性能的影响被引量:5
2011年
采用陶瓷工艺制备了La、Zn替代的Srl-xLaxFel2-xZnxO19(x=0,0.05,0.1,0.15,0.2,0.25)锶铁氧体,分析了La3+,Zn2+共同取代对锶铁氧体结构和磁性能的影响。X射线衍射分析表明,随着La3+、Zn2+离子替代量的增加,锶铁氧体主体仍为六角晶结构。通过扫描电镜对样品的形貌结构进行分析,测试结果显示铁氧体晶粒主要呈六角锶铁氧体结构;随着La3+、Zn2+取代量的增加,晶粒变得细小。磁性能测量显示,样品的Br随掺杂量的增加先增大后减小,当取代量x=0.15时,Br达到最大值。Hcb和Hcj则随着La3+、Zn2+掺杂量的增加迅速减小。这说明添加适量的La3+、Zn2+可以有效地提高材料的剩磁,但对永磁体的矫顽力有不利影响。
章宏王忆姚少喜林秉坤吴捷
关键词:锶铁氧体离子取代磁性能
Charging Effect in Plasma Etching Mask of Hole Array
2013年
It has already been found that the round shape of holes can be changed into hexagonal shape during plasma etching processes.This work aims to understand the mechanism behind such a shape change using particle simulation method.The distribution of electric field produced by electrons was calculated for different heights from the mask surface.It is found that the field strength reaches its maximum around a hole edge and becomes the weakest between two holes. The field strength is weakened as moving away from the surface.The spatial distribution of this electric field shows obvious hexagonal shape around a hole edge at some distances from the surface. This charging distribution then affects the trajectories of ions that fall on a mask surface so that the round hole edge is etched to become a hexagonal hole edge.The changing of this hole shape will again alter the spatial distribution of electric field to enhance the charging effect dynamically.
张鹏王俊孙阳丁泽军
关键词:充电效应电场强度等离子体蚀刻
共2页<12>
聚类工具0