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Research progress on ultra-precision machining technologies for soft-brittle crystal materials被引量:5
2017年
Hang GAOXu WANGDongming GUOYuchuan CHEN
关键词:超精密加工技术晶体材料微电子领域KDPCZT
Investigation on the cleaning of KDP ultra-precision surface polished with micro water dissolution machining principle被引量:2
2017年
A potassium dihydrogen phosphate(KDP) optical crystal was machined to an ultra-precision surface with water-in-oil(W/O) micro emulsion polishing fluid. The micro water dissolution principle utilized in the machining process is discussed, its planarization mechanism is illustrated, and an ultra-precision polished surface with 2.205 nm RMS roughness is obtained. However, a substantial quantity of residual contamination remained on the polished surface after machining. This can seriously impact the optical performance of the crystal, and so it must be removed. Fourier transform infrared(FTIR) spectroscopy was used to conduct an investigation into the composition of the surface residue, and the results showed that the residue was comprised of organic chemicals with hydrocarbon chains and aromatic ether, i.e., mostly the polishing fluid. The cleaning method and the principle on which the KDP ultra precision surface investigation is based are discussed in detail, and the cleaning experiments with selected KDP-compatible organic solvents were then performed. FTIR transmittance spectra measurement and microscopic observations were employed to assess the effects of the cleaning process on the surface of the KDP crystal. The results showed that toluene cleaning achieved the most desirable results. This cleaning method produced a surface roughness of 1.826 nm RMS, which allows the KDP crystal to be applied to subsequent engineering applications.
CHEN YuChuanGAO HangWANG XuGUO DongMingTENG XiaoJi
关键词:KDP晶体抛光表面傅里叶变换红外光谱
KDP晶体(001)晶面纳米压痕的仿真研究被引量:4
2015年
在KDP晶体(001)晶面上进行了四种压头(即:维氏压头、玻氏压头、圆锥压头、球形压头)的纳米压痕仿真研究。仿真结果表明:完全加载时四种压头与KDP晶体接触位置存在不同程度应力集中。当载荷在0-8 m N范围内时,其与等效应力影响深度呈近似线性递增关系。完全卸载时,残余应力分布深度为1.3-1.5μm。相同载荷条件下,各压头对应的塑性损伤层深度之间关系与等效应力影响深度之间关系一致。此外,通过纳米压痕实验验证了KDP晶体材料模型及相关参数的正确性。
郭晓光刘子源高航郑桂林郭东明
关键词:KDP晶体纳米压痕
Nanoindentation on the doubler plane of KDP single crystal被引量:1
2013年
The nanohardness is from 1.44 to 2.61 GPa, the Vickers hardness is from 127 to 252 Vickers, and elastic modulus is from 52 to 123 GPa by the nanoindentation experiments on the doubler plane of KDP crystal. An indentation size effect is observed on the doubler plane in the test as the nanohardness and elastic modulus decreases with the increase of the maximum load. Slippage is identified as the major mode of plastic deformation, and pop-in events are attributed to the initiation of slippage. And the variation of unloading curve end is the result of stick effects between the indenter and the contact surface. The depth of the elastic deformation, which is between 40 and 75 nm, is responsible for the elastic deformation. The doubler plane of KDP crystal has anisotropy, and the relative anisotropy of nanohardness is 8.2% and the relative anisotropy of elastic modulus is 8.0%.
郭晓光张小冀唐宪钊郭东明高航滕晓辑
关键词:KDPDOUBLERPLANENANOINDENTATIONANISOTROPY
KDP晶体三倍频晶面微观力学行为及加工性能被引量:4
2016年
为了揭示磷酸二氢钾(KDP)晶体三倍频晶面微观弹塑性力学行为及加工性能,开展了纳米压痕研究。建立了KDP晶体三倍频晶面各向异性力学模型,基于光滑粒子流体动力学(SPH)方法对纳米压痕进行了数值仿真并完成了纳米压痕测试实验。实验结果表明:实验与仿真计算的载荷-压入深度关系曲线的相关系数为0.996 328,吻合度较高,验证了力学模型的正确性,得出KDP晶体三倍频晶面的屈服强度为240MPa。数值仿真结果显示:由于材料的各向异性,工件内部应力呈不规则圆弧状分布;载荷大小与等效应力影响深度呈近似线性递增关系;材料表面等效塑性应变分布形状与压头投影面几何形状相类似,存在复映效果。当载荷小于2mN时,各压头的残余应力深度差异性较小(小于0.2μm);随着载荷逐渐增大,这种差异不断扩大。得到的结果为实现KDP晶体三倍频晶面的高效低损伤加工提供了理论支撑。
郭晓光刘子源郑桂林郭东明
关键词:纳米压痕光滑粒子流体动力学数值仿真
Micro water dissolution machining principle and its application in ultra-precision processing of KDP optical crystal被引量:6
2015年
In this paper, a micro water dissolution machining(MWDM) principle is proposed for machining potassium dihydrogen phosphate(KDP) crystal using water-in-oil micro-emulsion as an abrasive-free polishing fluid. In addition, two instances of the application of this principle to ultra-precision machining of KDP crystals are presented. Computer-controlled optical surfacing(CCOS) and diamond wire cutting(DWC) process were carried out according to the MWDM principle. In the case of the CCOS technology, it is found that the micro-waviness was removed completely by following the MWDM principle. The surface undulation decreased from 40 nm to less than 10 nm, and the surface root-mean-square(rms) roughness obviously reduced from 8.147 to 2.660 nm. In the case of the DWC process, the surface rms roughness reduced from 8.012 to 2.391 μm, and the cutting efficiency was improved. These results indicate that the MWDM principle can efficiently improve the machining quality of KDP optical crystal and has a great potential to machine water-soluble materials.
GAO HangWANG XuTENG XiaoJiGUO DongMing
关键词:超精密加工KDP晶体光学表面
悬砂法工艺参数对精密切割用线锯制备质量影响的研究被引量:3
2012年
为实现KDP、CZT等光学元件用软脆功能晶体坯料的精密切割,研究了悬砂法制备电镀金刚石微粉磨料线锯工艺方法,通过扫描电镜形貌观测,试验分析了不同电流密度、电镀时间和金刚石悬浮量条件下制备的线锯样件质量,探讨了工艺参数对线锯电镀质量的影响及缺陷产生的原因。试验结果表明,悬砂法制备金刚石微粉磨料线锯能够克服埋砂法存在的微粉磨粒分散性差、易导致连续运动的丝线挂砂困难等问题,在合理的工艺参数条件下能够获得磨料分布均匀的电镀金刚石微粉磨料丝线。
高航黄均亮袁和平滕晓辑
关键词:复合电镀
KDP晶体水溶解辅助金刚石线锯精密切割试验研究被引量:3
2015年
针对软脆功能晶体材料KDP晶体切割过程中极易开裂的问题,采用电镀金刚石线锯切割KDP晶体,利用该材料极易潮解的性质,变不利因素为有利条件,提出基于微乳液的水溶解辅助金刚石线锯切割新方法。结果表明:采用水解辅助线锯切割方法同比油冷却切割,不仅能够获得较低的切割表面粗糙度,而且可以提高切割效率15%~20%。
滕晓辑高航王旭陈玉川
关键词:KDP晶体微乳液
微纳水溶解抛光工艺参数对KDP晶体表面粗糙度影响的试验研究被引量:2
2015年
微纳水溶解抛光与计算机控制光学表面成形(CCOS)小工具抛光技术相结合,是针对大尺寸易溶于水的KDP晶体元件的一种有效加工方法。本文针对小工具抛光中行星运动方式及水溶解抛光工艺特点,为揭示各抛光工艺参数对KDP晶体表面粗糙度的影响规律,对晶体进行均匀抛光,并以抛光头转速比和转速、自转和公转方向、抛光载荷、抛光头直径、抛光液含水量为参变量,得到了最优抛光参数:抛光头公转自转反向,转速100 r/min;抛光液含水量7.5%(质量分数);使用较大尺寸抛光头(工件尺寸的十分之一至五分之一)。
王旭高航陈玉川滕晓辑
关键词:KDP晶体表面粗糙度
Investigation of the trajectory uniformity in water dissolution ultraprecision continuous polishing of large-sized KDP crystal
2020年
Large-sized potassium dihydrogen phosphate(KDP)crystals are an irreplaceable nonlinear optical component in an inertial confinement fusion project.Restricted by the size,previous studies have been aimed mainly at the removal principle and surface roughness of small-sized KDP crystals,with less research on flatness.Due to its low surface damage and high machining efficiency,water dissolution ultraprecision continuous polishing(WDUCP)has become a good technique for processing large-sized KDP crystals.In this technique,the trajectory uniformity of water droplets can directly affect the surface quality,such as flatness and roughness.Specifically,uneven trajectory distribution of water droplets on the surface of KDP crystals derived from the mode of motion obviously affects the surface quality.In this study,the material removal mechanism of WDUCP was introduced.A simulation of the trajectory of water droplets on KDP crystals under different eccentricity modes of motion was then performed.Meanwhile,the coefficient of variation(CV)was utilized to evaluate the trajectory uniformity.Furthermore,to verify the reliability of the simulation,some experimental tests were also conducted by employing a large continuous polisher.The results showed that the CV varied from 0.67 to 2.02 under the certain eccentricity mode of motion and varied from 0.48 to 0.65 under the uncertain eccentricity mode of motion.The CV of uncertain eccentricity is always smaller than that of certain eccentricity.Hence,the uniformity of trajectory was better under uncertain eccentricity.Under the mode of motion of uncertain eccentricity,the initial surface texture of the100 mm×100 mm×10 mm KDP crystal did achieve uniform planarization.The surface root mean square roughness was reduced to 2.182 nm,and the flatness was reduced to 22.013μm.Therefore,the feasibility and validity of WDUCP for large-sized KDP crystal were verified.
Zhipeng ChengHang GaoZiyuan LiuDongming Guo
关键词:FLATNESS
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