We investigate the mechanism for the improvement of p-type doping efficiency in Mg-Al0.14Ga0.86N/GaN superlattices(SLs).It is shown that the hole concentration of SLs increases by nearly an order of magnitude,from 1.1×1017 to 9.3×1017cm-3,when an AlN interlayer is inserted to modulate the strains.Schro¨dinger-Poisson self-consistent calculations suggest that such an increase could be attributed to the reduction of donor-like defects caused by the strain modulation induced by the AlN interlayer.Additionally,the donor-acceptor pair emission exhibits a remarkable decrease in intensity of the cathodoluminescence spectrum for SLs with an AlN interlayer.This supports the theoretical calculations and indicates that the strain modulation of SLs could be beneficial to the donor-like defect suppression as well as the p-type doping efficiency improvement.
In order to solve the problems of GaN heteroepitaxy on sapphire substrate,some techniques were explored.Freestanding GaN substrates have been made by hydride vapor phase epitaxy(HVPE),laser lift-off(LLO),and chemical mechanical polishing techniques.Wafer bending and cracking in the HVPE growth were partly settled by pulsed flow modulation method.High-crystal quality was established for 1.2 mm thick GaN substrate by X-ray diffraction measurement,in which the full width of half maximum values were 72,110 arcsec for(102),(002)peaks.A novel micro-size patterned sapphire substrate(PSS)and a nano PSS were also fabricated.High-power vertical structure light emitting diodes(VSLEDs)have been developed by Au–Sn eutectic wafer bonding,homemade micro-area LLO,and light extraction structure preparation.The high-injection-level active region with low temperature GaN sandwiched layers was used for lowefficiency droop.The light output power of VSLED was achieved as 400 mW driven at 350 mA,and the dominant wavelength is about 460 nm.The structures and properties of strain modulated superlattices(SLs)and quantum wells as well as advanced simulation of carriers transport across the electron blocking layer were investigated in laser diodes.The hole concentration was achieved as high as1.6 9 1018cm-3in AlGaN/GaN SLs:Mg by inserting an AlN layer.High-quality AlGaN epilayers and structures were grown by MOCVD.Some device structures of UV LEDs and detectors were demonstrated.The emission wavelength of 262 nm UV LED has been successfully fabricated.At last,high-quality InN and InGaN materials for solar cell were grown by boundary-temperature-controlled epitaxy and growth-temperature-controlled epitaxy.Hall-effect measurement showed a recorded electron mobility of 3,280 cm2/(V s)and a residual electron concentration of 1.47 9 1017cm-3at 300 K.
The growth and properties of N-polar Ga N layers by metal organic chemical vapor deposition(MOCVD) were reported. It is found that N-polar Ga N grown on normal sapphire substrate shows hexagonal hillock surface morphology. With the misorientation angles increasing from 0.5° to 2.0° toward the a-plane of the sapphire substrate, the number of the hillock becomes less and less and finally the surface becomes flat one on the sapphire substrate with the misorientation angle of 2°. It is also found that the crystalline quality and the strain in the Ga N are greatly influenced by the misorientation angle.
