Atomic force microscopy is used to estimate and compare the surface morphologyof hydrogenated and hydrogen-free diamond-like carbon (DLC) films.The films were preparedby using DC magnetron sputtering of a graphite target,pulsed cathodic carbon arcs,electron cy-clotron resonance (ECR),plasma source ion implantation and dielectric barrier discharge (DBD).The difference in the surface structure is presented for each method of deposition.The influ-ences of various discharge parameters on the film surface properties are discussed based uponthe experimental results.The coalescence process via the diffusion of adsorbed carbon speciesis responsible for the formation of hydrogen-free DLC films with rough surfaces.The films withsurface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionizedcarbon plasma.The dangling bonds created by atomic hydrogen lead to the uniform growth ofhydrocarbon species at the a-C:H film surfaces of the ECR or DBD plasmas.
Plasma polymerized fluorocarbon (FC) films have been deposited on silicon sub-strates from dielectric barrier discharge (DBD) plasma of C_4F_8 at room temperature under apressure of 25～125 Pa.The effects of the discharge pressure and frequency of power supply onthe films have been systematically investigated.FC films with a less cross linked structure may beformed at a relatively high pressure.Increase in the frequency of power supply leads to a signifi-cant increase in the deposition rate.Static contact angle measurements show that deposited FCfilms have a stable,hydrophobic surface property.All deposited films show smooth surfaces withan atomic surface roughness.The relationship between plasma parameters and the properties ofthe deposited FC films are discussed.
