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国家教育部博士点基金(20110203110010)

作品数:4 被引量:3H指数:1
相关作者:王旭贾仁需张玉明更多>>
相关机构:西安电子科技大学更多>>
发文基金:国家教育部博士点基金国家自然科学基金国家重点基础研究发展计划更多>>
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Fabrication of a monolithic 4H-SiC junction barrier schottky diode with the capability of high current被引量:2
2015年
There is a great interest in monolithic 4H-Si C Junction Barrier Schottky(JBS) diodes with the capability of a high forward current for industrial power applications.In this paper,we report large-area monolithic 4H-Si C JBS diodes fabricated on a 10 μm 4H-Si C epitaxial layer doped to 6×1015 cm3.JBS diodes with an active area of 30 mm2 had a forward current of up to 330 A at a forward voltage of 5 V,which corresponds to a current density of 1100 A/cm2.A near ideal breakdown voltage of 1.6 k V was also achieved for a reverse current of up to 100 A through the use of an optimum multiple floating guard rings(MFGR) termination,which is about 87.2% of the theoretical value.The differential specific-on resistance(RSP-ON) was measured to be 3.3 m cm2,leading to a FOM(VB2/RSP-ON) value of 0.78 GW/cm2,which is very close to the theoretical limit of the tradeoff between the specific-on resistance and breakdown voltage for 4H-Si C unipolar devices.
SONG QingWenYUAN HaoHAN ChaoZHANG YuMingTANG XiaoYanZHANG YiMengGUO HuiZHANG YiMenJIA RenXuWANG YueHu
关键词:高电流肖特基4H-SIC功率二极管
Fabrications and characterizations of high performance 1.2 kV,3.3 kV, and 5.0 kV class 4H–SiC power SBDs被引量:1
2016年
In this paper, 1.2 kV, 3.3 kV, and 5.0 kV class 4H-SiC power Schottky barrier diodes (SBDs) are fabricated with three N-type drift layer thickness values of 10 μm, 30μm, and 50 μm, respectively. The avalanche breakdown capabilities, static and transient characteristics of the fabricated devices are measured in detail and compared with the theoretical pre- dictions. It is found that the experimental results match well with the theoretical calculation results and are very close to the 4H-SiC theoretical limit line. The best achieved breakdown voltages (BVs) of the diodes on the 10 p.m, 30 m, and 50 -tm epilayers are 1400 V, 3320 V, and 5200 V, respectively. Differential specific-on resistances (Ron-sp) are 2.1 m--cm2, 7.34 mO. cm2, and 30.3 m-. cm2, respectively.
宋庆文汤晓燕袁昊王悦湖张艺蒙郭辉贾仁需吕红亮张义门张玉明
关键词:4H-SICBREAKDOWN
The fabrication and characterization of 4H-SiC power UMOSFETs
2013年
The fabrication of 4H-SiC vertical trench-gate metal-oxide-semiconductor field-effect transistors(UMOSFETs) is reported in this paper.The device has a 15-μm thick drift layer with 3×10^15 cm^-3 N-type doping concentration and a 3.1μm channel length.The measured on-state source-drain current density is 65.4 A/cm^2 at Vg = 40 V and VDS = 15 V.The measured threshold voltage(Vth) is 5.5 V by linear extrapolation from the transfer characteristics.A specific on-resistance(Rsp-on) is 181 mΩ·cm^2 at Vg = 40 V and a blocking voltage(BV) is 880 V(IDS = 100 μA@880V) at Vg = 0 V.
宋庆文张玉明韩吉胜Philip TannerSima Dimitrijev张义门汤晓燕郭辉
关键词:4H-SIC
Y_2O_3/Si界面电学特性研究
2016年
为了研究不同退火温度对Y2O3/Si界面电学特性的影响,对Y2O3/Si界面做快速热退火处理。用C-V和I-V方法对Al/Y2O3/Si/Al MOS电容进行电学特性测试。结果表明:界面态密度随着退火温度升高而减小,此外,经400℃退火后,MOS电容有最大的击穿场强(5 MV/cm),这是由于在400℃退火条件下陷阱密度减小,界面特性改善;由于Y2O3的结晶温度低,在500℃下Y2O3结晶,形成漏电路径,导致漏电流增加,击穿场强减小,在600℃时击穿电场仅有1.5MV/cm;由以上结果可以得出,随着退火温度的增加,界面陷阱密度会减小,但高温(>500℃)会使Y2O3结晶,导致漏电流增大,击穿电场减小。
王旭贾仁需张玉明
关键词:退火界面态密度击穿电场
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