Core-shell nanostructures have attracted considerable attention in the past decades because of their fundamental scientific significance and many technological applications.Recently,it has been reported that the core-shell nanostructures with advanced compositions and complicated morphologies show great potential as high-performance microwave absorbers due to their unique properties,such as large surface areas,multi-functionalities and synergistic effects between the interior core and outer shell.This review article focuses on the recent progress in synthesis and characterization of hierarchical magnetic core-shell nanostructures for microwave absorption applications based on our own work.In addition,several future trends in this field for next-generation microwave absorbers are discussed.
LIU JiWeiXU JunJieLIU ZhengWangLIU XiaLinCHE RenChao
Electric-field-induced resistance switching(RS) phenomena have been studied for over 60 years in metal/dielectrics/metal structures.In these experiments a wide range of dielectrics have been studied including binary transition metal oxides,perovskite oxides,chalcogenides,carbon-and silicon-based materials,as well as organic materials.RS phenomena can be used to store information and offer an attractive performance,which encompasses fast switching speeds,high scalability,and the desirable compatibility with Si-based complementary metal-oxide-semiconductor fabrication.This is promising for nonvolatile memory technology,i.e.,resistance random access memory(RRAM).However,a comprehensive understanding of the underlying mechanism is still lacking.This impedes faster product development as well as accurate assessment of the device performance potential.Generally speaking,RS occurs not in the entire dielectric but only in a small,confined region,which results from the local variation of conductivity in dielectrics.In this review,we focus on the RS in oxides with such an inhomogeneous conductivity.According to the origin of the conductivity inhomogeneity,the RS phenomena and their working mechanism are reviewed by dividing them into two aspects:interface RS,based on the change of contact resistance at metal/oxide interface due to the change of Schottky barrier and interface chemical layer,and bulk RS,realized by the formation,connection,and disconnection of conductive channels in the oxides.Finally the current challenges of RS investigation and the potential improvement of the RS performance for the nonvolatile memories are discussed.
The I–V characteristics of In2O3:SnO2/TiO2/In2O3:SnO2 junctions with different interfacial barriers are inves- tigated by comparing experiments. A two-step resistance switching process is found for samples with two interfacial barriers produced by specific thermal treatment on the interfaces. The nonsynchronous occurrence of conducting filament formation through the oxide bulk and the reduction in the interfacial barrier due to the migration of oxygen vacancies under the electric field is supposed to explain the two-step resistive switching process. The unique switching properties of the device, based on interfacial barrier engineering, could be exploited for novel applications in nonvolatile memory devices.
